Evaluation of the phase error in Si-wire arrayed-waveguide gratings fabricated by ArF-immersion photolithography

Kyosuke Muramastu, Hideaki Asakura, Keijiro, Suzuki, Ken Tanizawa, Munehiro Toyama, Minoru Ohtsuka, Nobuyuki Yokoyama, Kazuyuki Matsumaro, Miyoshi Seki, Keiji Koshino, Kazuhiro Ikeda, Shu Namiki, Hitoshi Kawashima, and Hiroyuki Tsuda

IEICE Electronics Express

IEICE

12

7

20150019

2015-04

maru

Batu

English

Overseas

Research Paper (Scientific Journal)

Joint Work(other)